IM has developed three advanced materials platforms for next generation lithography applications. These are:

• Extreme Ultra-Violet (EUV) Photo-Resist materials
• Spin-on-Carbon Hardmask materials
• Electron-Beam (E-Beam) materials

Our material consist of patented small molecules, developed to address the specific requirements of each application space.

IM is actively developing relationships with strategic partners, licensees, and end-users to advance commercialization of our proprietary materials.