Resources

Journal Papers

EUV Lithography

Optimization of fullerene-based negative tone chemically amplified fullerene resist for extreme ultraviolet lithography A. Frommhold, D.X. Yang, A. McClelland, X. Xue, Y. Ekinci, R.E. Palmer, A.P.G. Robinson, Proc SPIE, 9051, 905119 (2014). Search DOI Request Reprint

Performance of negative tone chemically amplified fullerene resists in extreme ultraviolet lithography A. Frommhold, D.X. Yang, A. McClelland, X. Xue, Y. Ekinci, R.E. Palmer, A.P.G. Robinson, J Micro/Nanolithography, MEMS, and MOEMS, 12, 033010 (2013). Search DOI Request Reprint OPEN ACCESS

Chemically Amplified Fullerene Resists, Spin-on Fullerene Hardmasks and High Aspect Ratio Etching A. Frommhold, D.X. Yang, J. Manyam, M. Manickam, E. Tarte, J.A. Preece, R.E. Palmer, A.P.G. Robinson, IEEE-NANO, 1-6 (2012). Search DOI Request Reprint

Electron Beam Lithography

Helium ion beam lithography on fullerene molecular resists for sub-10 nm patterning X. Shi, P. Prewett, E. Huq, D.M. Bagnall, A.P.G. Robinsond, S.A. Boden, Microelectronic Engineering, 155, 74-78 (2016). Search DOI Request Reprint

Chemically Amplified Phenolic Fullerene Electron Beam Resist D.X. Yang, A. Frommhold, X. Xue, R.E. Palmer, A.P.G. Robinson, J Mater Chem C, 2, 1505-1512 (2014). Search DOI Request Reprint OPEN ACCESS

Positive Tone Chemically Amplified Fullerene Resist J. Manyam, A Frommhold, D.X. Yang, A. McClelland, M. Manickam, J.A. Preece, R.E. Palmer, A.P.G. Robinson, Proc SPIE, 8325, 83251U (2012). Search DOI Request Reprint

Chemically Amplified Fullerene Resists for e-Beam Lithography J. Manyam, F.P. Gibbons, S. Diegoli, M. Manickam, J.A. Preece, R.E. Palmer, A.P.G. Robinson, Proc SPIE, 6923, 69230M (2008). Search DOI Request Reprint

Fullerene Resist Materials for the 32nm Node and Beyond F.P. Gibbons, A.P.G. Robinson, R.E. Palmer, S. Diegoli, M. Manickam, J.A. Preece, Adv. Funct. Mater., 18, 1977 (2008). Search DOI Request Reprint

A High Resolution Water Soluble Fullerene Molecular Resist For Electron Beam Lithography X. Chen, R.E. Palmer, A.P.G. Robinson, Nanotechnology, 19, 275308 (2008). Search DOI Request Reprint

A Chemically Amplified Fullerene Derivative Molecular Electron Beam Resist F.P. Gibbons, H.M. Zaid, M. Manickam, J.A. Preece, R.E. Palmer, A.P.G. Robinson, Small, 3, 2076 (2007). Search DOI Request Reprint

Ultrathin Fullerene Films as High-Resolution Molecular Resists for Low-Voltage Electron-Beam Lithography F.P. Gibbons, A.P. G. Robinson, R.E. Palmer, M. Manickam, J.A. Preece, Small, 2, 1003 (2006). Search DOI Request Reprint

A Fullerene Derivative as an Electron Beam Resist for Nanolithography A.P.G. Robinson, R.E. Palmer, T. Tada, T. Kanayama, J.A. Preece, Appl. Phys. Lett., 72, 1302 (1998). Search DOI Request Reprint

Resist Etching

Formation of Nanoscale Structures by Inductively Coupled Plasma Etching C.C. Welch, D.L. Olynick, Z. Liu, A. Holmberg, C. Peroz, A.P.G. Robinson, M.D. Henry, A. Scherer, T. Mollenhauer, V. Genova, D.K.T. Ng, Proc SPIE, 8700, 870002 (2013). Search DOI Request Reprint

Plasma Etching of High-resolution Features in a Fullerene Molecular Resist J. Manyam, M. Manickam, J.A. Preece, R.E. Palmer, A.P.G. Robinson, Proc SPIE, 7972, 79722N (2011). Search DOI Request Reprint

Spin-on-Carbon

Spin-on Carbon using Fullerene derivatives A. Frommhold, A.G. Brown, T. Lada, R.E. Palmer, A.P.G. Robinson, Proc SPIE, 9054, 90540Q (2014). Search DOI Request Reprint

Spin-on-carbon hardmask based on fullerene derivatives for high-aspect ratio etching A. Frommhold, R.E. Palmer, A.P.G. Robinson, J Micro/Nanolithography, MEMS, and MOEMS, 12, 033003 (2013). Search DOI Request Reprint OPEN ACCESS

High aspect ratio etching using a fullerene derivative spin-on-carbon hardmask A. Frommhold, J. Manyam, R.E. Palmer, A.P.G. Robinson, Proc SPIE, 8328, 83280U (2012). Search DOI Request Reprint

Fullerene based Spin on Carbon Hardmask J. Manyam, A. Frommhold, R. E. Palmer, A.P.G. Robinson, Microelectron. Eng., 98, 552 (2012). Search DOI Request Reprint

Other

Low Activation Energy Fullerene Molecular Resist J. Manyam, M. Manickam, J.A. Preece, R.E. Palmer, A.P.G. Robinson, Proc SPIE, 7273, 72733D (2009). Search DOI Request Reprint

Direct Electron Beam Writing of Highly Conductive Wires in Functionalized Fullerene Films F.P. Gibbons, M. Manickam, J.A. Preece, R.E. Palmer, A.P.G. Robinson, Small, 5, 2750 (2009). Search DOI Request Reprint

Characterisation of the Effects of Base Additives on a Fullerene Chemically Amplified Resist J. Manyam, M. Manickam, J.A. Preece, R.E. Palmer, A.P.G. Robinson, Proc SPIE, 7639, 7639N (2010). Search DOI Request Reprint

Conference Presentations

Resist

Optimisation of Fullerene based Negative Tone Chemically Amplified Resist for Extreme Ultraviolet Lithography A. Frommhold, D.X. Yang, R.E. Palmer, X. Xue, Y. Ekinci, A.P.G. Robinson, Presented at SPIE Advanced Lithography, 2014, San Jose, USA. Download Presentation

A Platinum-Fullerene Complex for Patterning Metal Containing Nanostructures D.X. Yang, A. Frommhold, D.S. He, Z.Y. Li, R.E. Palmer, M.A. Lebedeva, T.W. Chamberlain, A.N. Khlobystov, A.P.G. Robinson, Presented at SPIE Advanced Lithography, 2014, San Jose, USA. Coming Soon

Evaluation of Negative Tone Chemically Amplified Fullerene Resist for Extreme Ultraviolet Lithography A. Frommhold, D.X. Yang, R.E. Palmer, X. Xue, Y. Ekinci, A.P.G. Robinson, Presented at Micro and Nanoengineering (MNE), 2013, London, UK. Download Presentation

Fullerene Derivatives as High Resolution Negative Tone Electron Beam Resists D.X. Yang, J. Manyam, R.E. Palmer, X. Xue, A.P.G. Robinson, Presented at Micro and Nanoengineering (MNE), 2013, London, UK. Download Presentation

EUV Lithography Performance of Negative tone Chemically Amplified Fullerene Resist A. Frommhold, D.X. Yang, R.E. Palmer, A. McClelland, X. Xue, A.P.G. Robinson, Presented at SPIE Advanced Lithography, 2013, San Jose, USA. Download Presentation

Electron and EUV lithography with fullerene based molecular photoresists D.X. Yang, A. Frommhold, J. Manyam, M. Manickam, J.A. Preece, R.E. Palmer, A.P.G. Robinson, Presented at Micro and Nanoengineering (MNE), 2012, Toulouse, France. Download Presentation

Spin-on-Carbon

Spin-on Carbon using Fullerene Derivatives A. Frommhold, A.G. Brown, T. Lada, R.E. Palmer, A.P.G. Robinson, Presented at SPIE Advanced Lithography, 2014, San Jose, USA. Download Presentation

Fullerene derivatives as spin-on-carbon material for high aspect ratio etching A. Frommhold, T. Lada, R.E. Palmer, A.P.G. Robinson, Presented at Micro and Nanoengineering (MNE), 2013, London, UK. Download Presentation

Spin-on Carbon based on Fullerene derivatives as hardmask material for high aspect ratio etching A. Frommhold, R.E. Palmer, A.P.G. Robinson, Presented at SPIE Advanced Lithography, 2013, San Jose, USA. Download Presentation

High aspect ratio etching using a fullerene derivative spin-on-carbon hardmask A. Frommhold, J. Manyam, R.E. Palmer, A.P.G. Robinson, Presented at SPIE Advanced Lithography, 2012, San Jose, USA. Download Presentation

Resolution, Thermal Performance and Mechanical Stability of Fullerene based Spin on Hardmasks J. Manyam, R.E. Palmer, A. Frommhold, A.P.G. Robinson, Presented at Micro and Nanoengineering (MNE), 2012, Toulouse, France. Download Presentation