News

Irresistible Materials in the News:

Los Angeles High Tech News: Euv Light Technology

SemiWiki.com: SPIE 2017: Irresistible Materials EUV Photoresist

EE News Analog: Chemistry startup claims EUV resist breakthrough

EET Asia.com: Resist-based material targets EUV lithography use

Irresistible Materials unveils new EUV compatible photoresist chemistry at SPIE, delivering 2x increase in Sensitivity and productivity.

BIRMINGHAM, UK, and Westborough, Mass. Feb. 24, 2017 – a UK advanced materials technology company spun-out from the University of Birmingham, announced today that in the upcoming SPIE Advanced Lithography Conference in San Jose, they will be revealing their new photoresist material, alongside breakthrough performance both Sensitivity (photoresist speed) and productivity.

David Ure, Founder of Irresistible Materials (IM), said: "Through the past 2 years, IM has developed a new generation of photo-resist products to address the needs of EUV lithography. Our new resist materials are based on a novel chemistry known as a 'Multi-Trigger resist system'. The IM Multi-Trigger resists are the first high performance EUV resists that are non-metal based and do not need a post exposure bake (PEB). We are excited to introduce this new material to the industry at the upcoming SPIE conference."

IM will be revealing details of this new resist system at SPIE this February. The announcements will also include performance data demonstrating a break-through in EUV Sensitivity (over two-fold improvement over known alternatives), coupled to excellent contact hole resolution and low LER. IM will also be announcing progress towards High Volume Manufacturing (HVM) readiness of the novel resist products. HVM readiness is being undertaken in partnership with Nano-C, a Massachusetts based manufacturer of advanced electronic materials and chemicals. The announcements will be made on the following dates at the SPIE Advanced Lithography Conference:

  • A 5min overview presentation on Tue 28th Feb, during Session 8 (3:40pm to 5:10pm).
  • A 20min technical presentation at 9:40am on Wed 1st March (Session 9, Talk: 10143-27).
  • A poster presentation from 6pm to 8pm (Poster #: 10143-75) on Wed 1st March.

About Irresistible Materials

IM was created in 2010 to further develop and commercialise the University of Birmingham's lithographic materials technology for the next generation of microchips. Since launch, IM has developed an extensive patent portfolio covering innovative resist (EUV and E-beam) and hard-mask materials. It continues to work closely with the University, alongside a growing network of partners and collaborators worldwide to both develop and commercialize its materials portfolio. For more information, visit: www.irresistiblematerials.com.

About Nano-C, Inc.

Located in Westwood, Massachusetts, Nano-C is a leading developer of nanostructured carbon for use in energy and electronics applications. These materials include fullerenes, carbon nanotubes and their chemical derivatives. Nano-C's mission is to play a key role in enabling applications of these materials and is committed to their responsible development and use. Nano-C is a privately held company founded in 2001. For more information, visit: www.nano-c.com

Contact:
Mark Shepherd
Irresistible Materials

Contact:
Viktor Vejins
Nano-C, Inc.

Warren Montgomery Joins Irresistible Materials to Drive the Commercialization of EUV Resists

BIRMINGHAM, UK, and Westborough, Mass. Feb. 09, 2017 – Irresistible Materials (IM), a UK materials technology company spun-out from the University of Birmingham, announced today that Warren Montgomery has joined IM as Vice President of Product Strategy & Commercialization. In the new role, Warren will be instrumental in guiding the successful commercial launch of IM's resist products.

Warren Montgomery joins IM from the College of NanoScale Science and Engineering (CNSE) in Albany NY, where he was Assistant Vice President of Technical and Consortia Program Development. Warren was the first CNSE assignee to SEMATECH in the role of Resist and Materials Development Center Manager. Prior to CNSE, Warren worked at Applied Materials, LSI Logic, ASML, AZ Microelectronic and IBM in various technical and leadership roles. During his extensive career in Lithography, Warren has written over fifty technical publications and has been awarded 30 US and European patents.

On joining IM, Warren Montgomery said, "EUV lithography is moving toward high-volume manufacturing (HVM) for advanced semiconductor chip production. A key need continues to be high performance photoresists. Irresistible Materials (IM) has developed a low cost of ownership, high resolution, and low dose photoresist that represents a new and exciting approach to HVM patterning. I am looking forward, with great enthusiasm, to this opportunity to work with the IM team to help commercialize this exciting technology."

Mark Shepherd, CEO of IM, said, "We are delighted to welcome Warren to Irresistible Materials. His expertise and experience in our industry gives valuable depth to our expanding team that includes our key development partner and chemicals supplier, Nano-C, Inc. These have been important steps in building our capabilities over recent months and Irresistible Materials is now well placed to bring its cutting edge resist and hard mask products to the market place in time for the introduction of EUV lithography".

About Irresistible Materials

IM was created in 2010 to further develop and commercialise the University of Birmingham's lithographic materials technology for the next generation of microchips. Since launch, IM has developed an extensive patent portfolio covering innovative resist (EUV and E-beam) and hard-mask materials. It continues to work closely with the University, alongside a growing network of partners and collaborators worldwide to both develop and commercialize its materials portfolio. For more information, visit: www.irresistiblematerials.com.

About Nano-C, Inc.

Located in Westwood, Massachusetts, Nano-C is a leading developer of nanostructured carbon for use in energy and electronics applications. These materials include fullerenes, carbon nanotubes and their chemical derivatives. Nano-C's mission is to play a key role in enabling applications of these materials and is committed to their responsible development and use. Nano-C is a privately held company founded in 2001. For more information, visit: www.nano-c.com

Contact:
Mark Shepherd
Irresistible Materials

Contact:
Viktor Vejins
Nano-C, Inc.

Irresistible Materials announces license agreement with MicroChem Corp

BIRMINGHAM, UK, January 27, 2015 – Irresistible Materials is pleased to announce a Licence Agreement with MicroChem Corp, to distribute IM's novel spin-on-carbon materials

Press Release

MicroChem Corp Website

As the features shrink, Irresistible Materials grows

BIRMINGHAM, UK, July 7, 2014 – Latest technology results from Irresistible Materials (IM) have demonstrated a significant jump forwards in achievable resolution via its EUV photoresist. The team have recently demonstrated 13 nm halfpitch resolution patterning, together with promising results at 11 nm halfpitch. Alongside this the company has introduced a new metal complex resist platform for EUV and Electron Beam Lithography resolution and sensitivity enhancement; has demonstrated pattern transfer of 11 nm features with an aspect ratio of 16:1 from its spin-on-carbon product line; and has shown first results combining the spin-on-carbon with a 10 nm resolution directed self-assembly (DSA) lithography process.

Irresistible Materials, a UK materials technology company spun-out from the University of Birmingham, is therefore pleased to announce £235,000 of further support from the Technology Strategy Board and business angels from the US and UK, coupled with the appointment of Mark Shepherd as Chief Executive Officer. In addition Irresistible Materials welcomes Tim Hazell of Mercia Fund Management to the board.

Mark is an experienced CEO and has served as a Director at plc Board level in both commercial and technical roles. Mark has expertise in commercialising technology through product development and licensing of intellectual property worldwide. He was Inventor/founder and Business development Director of Xaar plc and subsequently CEO of several technology businesses including 1Limited and start-ups from the University of Manchester and Queen Mary University of London.

IM was created in 2010 to further develop and commercialise the University of Birmingham's photo-resist technology for next generation microchips. Photoresists are critical materials in the computer chip manufacturing process as they enable chip manufacturers to fabricate ever-smaller features for microelectronic devices. Current photoresist technologies cannot be used to fabricate the small features required for next generation chips, hence the need for a new generation of technology. IM's solution, based on a unique fullerene material developed at the University of Birmingham, has been successfully demonstrated to meet these requirements and the company has started engaging with the key industry suppliers to evaluate samples.

Mark Shepherd said "It is an exciting time for Irresistible Materials. The team has made significant advances over recent months in order to prove the capabilities of the technology and enable us to engage further with the major players in the industry. I am looking forward to seeing the Company's developments turn into real products that enable the next generation of semiconductor devices."

Tim Hazell commented, "Irresistible Materials not only has a technology which could be the basis for the next generation of microchips but a highly experienced and capable management team; that's a pretty attractive background for an early stage technology investor like Mercia Fund Management."

Irresistible Materials secures funding boost and new Chairman

BIRMINGHAM, UK, May 21, 2013 – Irresistible Materials (IM), a UK materials technology company spun-out from the University of Birmingham, is pleased to announce £290,000 of further support from its investing shareholder Mercia Fund Management and new business angels from the US and UK, coupled with the appointment of Stuart McIntosh as its new Chairman.

Stuart has 40 years experience of the semiconductor industry. Previously, he was the President of ASML a multi-billion pound company and the one of the world's leading suppliers of lithography tools to the semiconductor industry.

IM was created in 2010 to further develop and commercialise the University of Birmingham's photo-resist technology for the next generation of microchips.

Photoresists are critical materials in the computer chip manufacturing process as they enable chip manufacturers to fabricate ever-smaller features for microelectronic devices. Beyond 2016 current photoresist technologies cannot be used as these features will be too small for existing polymeric photoresists, hence the need for a new generation of technology. IM's solution, based on a unique fullerene material developed at the University of Birmingham, has been successfully demonstrated to meet these requirements and the company has started engaging with the key industry suppliers to evaluate samples.

Stuart said, "The semiconductor industry has spent many billions developing EUV technologies for 2016 production lines. Recently, ASML, the largest supplier of lithography tools to the global semiconductor markets, publically announced a significant investment by three of the largest semiconductor companies in the world to support R&D programmes necessary to produce the technologies the industry has laid out in the road map for lithography. IM has one of these critical technology components for EUV chip production and I'm pleased and excited to be working with this team of highly motivated people, who have successfully developed a leading technology using Fullerene materials and structures."

Everard Mascarenhas of Mercia Fund Management commented, "IM has made excellent progress both technically and commercially. Along-side the new investment, we are very pleased that the Company has succeeded in attracting an experienced and successful management team to continue the impressive development of the company."

David Coleman, Head of Spinout Portfolio for the University of Birmingham said, "IM is a great example of the type of spinout company that we develop. It has a unique material, proven to meet a critical need in the semiconductor industry, and a very experienced team in place well backed to undertake the next stages of its business plan."

About Irresistible Materials

Irresistible Materials is a University of Birmingham spinout company created to commercialise the fullerene based photo-resist technology developed by Dr Alex Robinson, Professor Richard Palmer, Professor Jon Preece and colleagues. The next generation of chip, 2016 and beyond, will require a new photoresist technology as existing polymer based photoresists do not have sufficient performance to support Extreme ultraviolet light (EUV) lithography. Fullerene based resist molecules are 10 times smaller than polymer based resists leading to enhanced performance. IM has been able to demonstrate that its patented solution meets all the major performance criteria set by the industry's ITRS technology roadmap, and shown patterning below 20nm.

Chip manufacturers are expected to be prototyping their 2016 production lines by the end of 2013 ahead of scaling up to full production in 2016. The company is now in discussion with many of the industry's key photoresist suppliers and chip manufacturers to evaluate its solutions for 2016 chip production.

About Mercia Fund Management

Mercia Fund Management (MFM) is a venture capital fund manager with over £17 million under active management.

MFM provides investment growth capital for businesses ranging from early commercial traction through to those seeking expansion or working capital that are trading profitably. Furthermore, MFM can also provide cost-effective incubator accommodation at Forward House in Henley-in-Arden coupled with centralised support services in keeping with its model as a hands-on, supportive investor.

Mercia Fund Management is an FCA authorised and regulated fund manager under FSMA (FRN: 524856).

For more information please see: http://www.merciafund.co.uk/

About The University of Birmingham

The University of Birmingham is a truly vibrant, global community and an internationally renowned institution. Ranked amongst the world's top 100 institutions, its work brings people from across the world to Birmingham, including researchers and teachers and more than 4,000 international students from nearly 150 countries.

The University is home to nearly 30,000 students. With more than 7,500 postgraduate students from across the world, Birmingham is one of the most popular universities for postgraduate study in the UK.

The University plays an integral role in the economic, social and cultural growth of local and regional communities; working closely with businesses and organisations, employing approximately 6,000 staff and providing 10,000 graduates annually.

About Alta Innovations

Alta Innovations Ltd is the technology transfer Office of The University of Birmingham and is responsible for the commercialisation of research undertaken at the University. Alta Innovations links academic research with business through licensing and spinout activity, collaborative research and consultancy projects to generate the new ideas, technologies and processes required to achieve competitive advantage.

For more information please see: http://www.birmingham.ac.uk/generic/alta-innovations/about/index.aspx