Irresistible Materials, began operations in 2010 to commercialize novel materials for applications in next generation lithography.

fullerene derivative

Building on over 10 years of research and development at the University of Birmingham's School of Chemical Engineering, Nanoscale Physics Research Laboratory and School of Chemistry, IM has developedĀ a comprehensive intellectual property portfolio, with over a dozen patents covering materials and processes for applications in next generation lithography, including EUV resists, Spin-on-Carbon, and e-beam resists.

To support ongoing technology development and the demonstration of the benefits of our materials, IM has built a strong team and alliance partner network. Key partners include the University of Birmingham (UK) and Nano-C Inc, a leading fullerene supplier based in Massachusetts, USA